Match tier
Likely match
Presence
Current · Arkansas
Last published
2021
Sources
OpenAlex · ORCID
Refreshed
2026-10-05
W
Wei Dou
This is a likely match — the affiliation was inferred from OpenAlex, ORCID, and web sources but has not been fully confirmed. Treat with appropriate caution.
Process engineer
Also affiliated: Dartmouth College (2018); Wilkes University (2018); University of Alabama (2018); University of Massachusetts Boston (2018)
17 h-index
46 pubs
1,583 cited
Links
Biography and Research Information
Metrics
- h-index: 17
- Publications: 46
- Citations: 1,583
Positions
-
Process engineer 2018–presentApplied Materials MDP ORCID
-
Process engineer publications 2015–2021University of Arkansas at Fayetteville ORCID
-
Research assistant 2013–2018University of Arkansas Fayetteville Electrical engineering ORCID
-
Reach assistant 2010–2013University of the Chinese Academy of Sciences Institute of Microelectronics ORCID
Selected Publications
-
Investigation of SiGeSn/GeSn/SiGeSn single quantum well with enhanced well emission (2021)
-
Growth and Characterization of SiGe on c-Plane Sapphire Using a Chemical Vapor Deposition System (2020)
-
Study of High Performance GeSn Photodetectors with Cutoff Wavelength up to 3.7 µm for Low-Cost Infrared Imaging (2019)
-
Investigation of SiGeSn/GeSn/SiGeSn Quantum Well Structures and Optically Pumped Lasers on Si (2019)
-
Si-based Mid-Infrared GeSn-Edge-Emitting Laser with Operating Temperature up to 260 K (2019)
-
Si-Based GeSn Photodetectors toward Mid-Infrared Imaging Applications (2019)
-
UHV-CVD growth of high quality GeSn using SnCl4: from material growth development to prototype devices (2019)
-
Si-based GeSn photodetectors towards mid-infrared imaging applications (2019)
-
Optically Pumped GeSn Lasers Operating at 270 K with Broad Waveguide Structures on Si (2019)
-
Si-Based Mid-Infrared GeSn-Edge-Emitting Laser with Operating Temperature up to 260 K (2019)
-
Investigation of SiGeSn/GeSn/SiGeSn Quantum Well Structures and Optically Pumped Lasers on Si (2019)
-
Study of High Performance GeSn Photodetectors with Cutoff Wavelength Up to 3.7 μm for Low-Cost Infrared Imaging (2019)
-
Silicon-based GeSn mid-infrared lasers (Conference Presentation) (2019)
-
Low temperature epitaxy of high-quality Ge buffer using plasma enhancement via UHV-CVD system for photonic device applications (2019)
-
All group-IV SiGeSn/GeSn/SiGeSn QW laser on Si operating up to 90 K (2018)