Jeongho Ahn Data-verified
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Full Professor
faculty
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Biography and Research Information
OverviewAI-generated summary
Jeongho Ahn's research program focuses on advanced metrology and mechanical systems. His work in semiconductor metrology utilizes hyperspectral imaging and spectroscopic ellipsometry to achieve super-resolution and non-destructive analysis. Recent publications explore techniques such as microsphere-assisted imaging and ultra-wide-field imaging Mueller matrix spectroscopic ellipsometry for characterizing semiconductor devices. Ahn also investigates complex mechanical phenomena, including nonlinear thermoviscoelastic beams and dynamic frictional contact, with publications addressing detachment waves and generalized Duffing equations under various contact conditions. Additionally, his research extends to biomaterials, with work on vascularized skin tissue models featuring hydrogels and adipose cell spheroids. Ahn holds an h-index of 12 with 52 publications and 525 citations.
Metrics
- h-index: 12
- Publications: 51
- Citations: 533
Selected Publications
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Mathematical and numerical study of detachment with frictional contact and adhesion in a two-mass system (2026)
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Mathematical and numerical study of detachment with frictional contactand adhesion in a two-mass system (2026)
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Dynamic contact of a beam–rod system with Signorini typed contact conditions and thermal effects (2025)
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Detachment Waves in Frictional Contact II: Analysis and Simulations of a Three-Mass System (2025)
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Detachment waves in frictional contact: analysis and simulations of a two-mass system (2024)
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A generalized Duffing equation with the Coulomb’s friction law and Signorini–type contact conditions (2023)
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Dynamic frictional thermoviscoelastic Gao beams (2021)
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Nonlinear thermoviscoelastic Timoshenko beams with dynamic frictional contact (2021)
Collaboration Network
Top Collaborators
- Microsphere-assisted hyperspectral imaging: super-resolution, non-destructive metrology for semiconductor devices
- Ultra-wide-field imaging Mueller matrix spectroscopic ellipsometry for semiconductor metrology
- Ultra-Wide-Field Imaging Mueller Matrix Spectroscopic Ellipsometry for Semiconductor Metrology
- Microsphere-assisted hyperspectral imaging: super-resolution, non-destructive metrology for semiconductor devices
- Ultra-wide-field imaging Mueller matrix spectroscopic ellipsometry for semiconductor metrology
- Ultra-Wide-Field Imaging Mueller Matrix Spectroscopic Ellipsometry for Semiconductor Metrology
- Detachment waves in frictional contact: analysis and simulations of a two-mass system
- Detachment Waves in Frictional Contact II: Analysis and Simulations of a Three-Mass System
- Ultra-wide-field imaging Mueller matrix spectroscopic ellipsometry for semiconductor metrology
- Ultra-Wide-Field Imaging Mueller Matrix Spectroscopic Ellipsometry for Semiconductor Metrology
- Ultra-wide-field imaging Mueller matrix spectroscopic ellipsometry for semiconductor metrology
- Ultra-Wide-Field Imaging Mueller Matrix Spectroscopic Ellipsometry for Semiconductor Metrology
- Ultra-wide-field imaging Mueller matrix spectroscopic ellipsometry for semiconductor metrology
- Ultra-Wide-Field Imaging Mueller Matrix Spectroscopic Ellipsometry for Semiconductor Metrology
- Ultra-wide-field imaging Mueller matrix spectroscopic ellipsometry for semiconductor metrology
- Ultra-Wide-Field Imaging Mueller Matrix Spectroscopic Ellipsometry for Semiconductor Metrology
- Ultra-wide-field imaging Mueller matrix spectroscopic ellipsometry for semiconductor metrology
- Ultra-Wide-Field Imaging Mueller Matrix Spectroscopic Ellipsometry for Semiconductor Metrology
- Ultra-wide-field imaging Mueller matrix spectroscopic ellipsometry for semiconductor metrology
- Ultra-Wide-Field Imaging Mueller Matrix Spectroscopic Ellipsometry for Semiconductor Metrology
- Ultra-wide-field imaging Mueller matrix spectroscopic ellipsometry for semiconductor metrology
- Ultra-Wide-Field Imaging Mueller Matrix Spectroscopic Ellipsometry for Semiconductor Metrology
- Ultra-wide-field imaging Mueller matrix spectroscopic ellipsometry for semiconductor metrology
- Ultra-Wide-Field Imaging Mueller Matrix Spectroscopic Ellipsometry for Semiconductor Metrology
- Microsphere-assisted hyperspectral imaging: super-resolution, non-destructive metrology for semiconductor devices
- Microsphere-assisted hyperspectral imaging: super-resolution, non-destructive metrology for semiconductor devices
- Microsphere-assisted hyperspectral imaging: super-resolution, non-destructive metrology for semiconductor devices
- Microsphere-assisted hyperspectral imaging: super-resolution, non-destructive metrology for semiconductor devices
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