Thomas I. Hollis Data-verified
Affiliation confirmed via AI analysis of OpenAlex, ORCID, and web sources.
Researcher
unknown
Research Areas
Biography and Research Information
OverviewAI-generated summary
Thomas I. Hollis investigates the electrochemical control of material properties, focusing on surface morphology and functional characteristics. His work includes studies on hierarchically structured, dendritic copper surfaces, examining how electrochemical methods can tailor their structure and performance. Hollis also researches the controlled exposure of copper oxide thin films, utilizing titanium dioxide overlayers deposited via atomic layer deposition as corrosion protection. His research network includes collaborators from the University of Arkansas at Fayetteville, such as Robert H. Coridan, Hamed Mehrabi, Samuel K. Conlin, and Caroline G. Eddy, with whom he has co-authored multiple publications.
Hollis's scholarly output includes a h-index of 2, with 3 total publications and 20 total citations. His recent activity indicates ongoing engagement in research.
Metrics
- h-index: 2
- Publications: 3
- Citations: 21
Selected Publications
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Electrochemical Control of the Morphology and Functional Properties of Hierarchically Structured, Dendritic Cu Surfaces (2022)
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Electrochemical control of the morphology and functional properties of hierarchically structured, dendritic Cu surfaces (2022)
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Controlled exposure of CuO thin films through corrosion-protecting, ALD-deposited TiO<sub>2</sub> overlayers (2021)
Collaboration Network
Top Collaborators
- Electrochemical Control of the Morphology and Functional Properties of Hierarchically Structured, Dendritic Cu Surfaces
- Controlled exposure of CuO thin films through corrosion-protecting, ALD-deposited TiO<sub>2</sub> overlayers
- Electrochemical control of the morphology and functional properties of hierarchically structured, dendritic Cu surfaces
- Electrochemical Control of the Morphology and Functional Properties of Hierarchically Structured, Dendritic Cu Surfaces
- Controlled exposure of CuO thin films through corrosion-protecting, ALD-deposited TiO<sub>2</sub> overlayers
- Electrochemical control of the morphology and functional properties of hierarchically structured, dendritic Cu surfaces
- Electrochemical Control of the Morphology and Functional Properties of Hierarchically Structured, Dendritic Cu Surfaces
- Electrochemical control of the morphology and functional properties of hierarchically structured, dendritic Cu surfaces
- Electrochemical Control of the Morphology and Functional Properties of Hierarchically Structured, Dendritic Cu Surfaces
- Electrochemical control of the morphology and functional properties of hierarchically structured, dendritic Cu surfaces
- Controlled exposure of CuO thin films through corrosion-protecting, ALD-deposited TiO<sub>2</sub> overlayers
- Controlled exposure of CuO thin films through corrosion-protecting, ALD-deposited TiO<sub>2</sub> overlayers
- Electrochemical control of the morphology and functional properties of hierarchically structured, dendritic Cu surfaces
- Electrochemical Control of the Morphology and Functional Properties of Hierarchically Structured, Dendritic Cu Surfaces
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