K. Reynolds Source Confirmed

Affiliation confirmed via AI analysis of OpenAlex, ORCID, and web sources.

Researcher

University of Arkansas at Fayetteville

faculty

4 h-index 12 pubs 109 cited

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Biography and Research Information

OverviewAI-generated summary

K. Reynolds conducts research on semiconductor materials, focusing on their electronic properties. Their recent publication in 2024 investigates the impact of biaxial strain on excitons in monolayer MoSe2, utilizing high-temperature physical vapor deposition techniques. This work contributes to the understanding of how mechanical stress can tune the optical and electronic behavior of 2D materials. Reynolds has a h-index of 4 and has authored 12 publications with 109 citations. Key collaborators include Shiva Davari and Hugh Churchill, both from the University of Arkansas at Fayetteville, with whom Reynolds has co-authored shared publications. Reynolds is actively publishing, with their most recent work appearing in 2024.

Metrics

  • h-index: 4
  • Publications: 12
  • Citations: 109

Selected Publications

  • Biaxial strain tuning of excitons in monolayer <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"><mml:msub><mml:mi>MoSe</mml:mi><mml:mn>2</mml:mn></mml:msub></mml:math> by high-temperature physical vapor deposition (2024) DOI

Collaborators

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