Shiva Davari Data-verified
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Grad. Student
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Biography and Research Information
OverviewAI-generated summary
Shiva Davari is a graduate student at the University of Arkansas at Fayetteville whose research centers on the study of semiconductor materials and their properties. Davari has investigated the phase decoherence in GeSn (8%) by measuring the weak antilocalization effect and explored the luminescence properties of GaN/InGaN/GaN double graded structures through a combination of experimental and simulation methods. Additionally, Davari's work includes the study of biaxial strain tuning of excitons in monolayer MoSe$_2$ using high-temperature physical vapor deposition. Davari has collaborated with researchers including Hugh Churchill, Yuriy I. Mazur, Reem Alhelais, and Morgan E. Ware, all from the University of Arkansas at Fayetteville, contributing to a total of eight publications. Davari's scholarly output includes an h-index of 2 and has garnered 43 citations.
Metrics
- h-index: 2
- Publications: 8
- Citations: 45
Selected Publications
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Biaxial strain tuning of excitons in monolayer <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"><mml:msub><mml:mi>MoSe</mml:mi><mml:mn>2</mml:mn></mml:msub></mml:math> by high-temperature physical vapor deposition (2024)
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Study of phase decoherence in GeSn (8%) through measurements of the weak antilocalization effect (2024)
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Experiment-simulation comparison of luminescence properties of GaN/InGaN/GaN double graded structures (2021)
Collaboration Network
Top Collaborators
- Study of phase decoherence in GeSn (8%) through measurements of the weak antilocalization effect
- Biaxial strain tuning of excitons in monolayer MoSe$_2$ by high-temperature physical vapor deposition
- Biaxial strain tuning of excitons in monolayer <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"><mml:msub><mml:mi>MoSe</mml:mi><mml:mn>2</mml:mn></mml:msub></mml:math> by high-temperature physical vapor deposition
- Biaxial strain tuning of excitons in monolayer MoSe$_2$ by high-temperature physical vapor deposition
- Biaxial strain tuning of excitons in monolayer <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"><mml:msub><mml:mi>MoSe</mml:mi><mml:mn>2</mml:mn></mml:msub></mml:math> by high-temperature physical vapor deposition
- Biaxial strain tuning of excitons in monolayer MoSe$_2$ by high-temperature physical vapor deposition
- Biaxial strain tuning of excitons in monolayer <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"><mml:msub><mml:mi>MoSe</mml:mi><mml:mn>2</mml:mn></mml:msub></mml:math> by high-temperature physical vapor deposition
- Experiment-simulation comparison of luminescence properties of GaN/InGaN/GaN double graded structures
- Experiment-simulation comparison of luminescence properties of GaN/InGaN/GaN double graded structures
- Experiment-simulation comparison of luminescence properties of GaN/InGaN/GaN double graded structures
- Experiment-simulation comparison of luminescence properties of GaN/InGaN/GaN double graded structures
- Experiment-simulation comparison of luminescence properties of GaN/InGaN/GaN double graded structures
- Experiment-simulation comparison of luminescence properties of GaN/InGaN/GaN double graded structures
- Experiment-simulation comparison of luminescence properties of GaN/InGaN/GaN double graded structures
- Biaxial strain tuning of excitons in monolayer MoSe$_2$ by high-temperature physical vapor deposition
- Biaxial strain tuning of excitons in monolayer MoSe$_2$ by high-temperature physical vapor deposition
- Biaxial strain tuning of excitons in monolayer MoSe$_2$ by high-temperature physical vapor deposition
- Biaxial strain tuning of excitons in monolayer MoSe$_2$ by high-temperature physical vapor deposition
- Biaxial strain tuning of excitons in monolayer MoSe$_2$ by high-temperature physical vapor deposition
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