Research Areas
Biography and Research Information
OverviewAI-generated summary
Katlin Reynolds' research focuses on the characterization of 2D materials, specifically molybdenum diselenide (MoSe₂) monolayers and graphene/hexagonal boron nitride heterostructures. Their work investigates the influence of substrate properties, such as interference and strain, on the second-harmonic generation of light from MoSe₂ monolayers. Additionally, Reynolds' research includes the surface roughness measurement of functionalized graphene and hexagonal boron nitride heterostructures using atomic force microscopy. Reynolds has co-authored two publications in 2024 and has a citation count of 10 with an h-index of 1. Key collaborators include Hugh Churchill, Jonathan Mishler, Salvador Barraza‐Lopez, and H. Nakamura, all from the University of Arkansas at Fayetteville.
Metrics
- h-index: 1
- Publications: 2
- Citations: 12
Selected Publications
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Substrate Interference and Strain in the Second-Harmonic Generation from MoSe<sub>2</sub> Monolayers (2024)
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Surface Roughness Measurement of Functionalized CVD Graphene and Hexagonal Boron Nitride Heterostructures Using Atomic Force Microscopy (2024)
Collaboration Network
Top Collaborators
- Substrate Interference and Strain in the Second-Harmonic Generation from MoSe<sub>2</sub> Monolayers
- Surface Roughness Measurement of Functionalized CVD Graphene and Hexagonal Boron Nitride Heterostructures Using Atomic Force Microscopy
- Surface Roughness Measurement of Functionalized CVD Graphene and Hexagonal Boron Nitride Heterostructures Using Atomic Force Microscopy
- Surface Roughness Measurement of Functionalized CVD Graphene and Hexagonal Boron Nitride Heterostructures Using Atomic Force Microscopy
- Surface Roughness Measurement of Functionalized CVD Graphene and Hexagonal Boron Nitride Heterostructures Using Atomic Force Microscopy
- Surface Roughness Measurement of Functionalized CVD Graphene and Hexagonal Boron Nitride Heterostructures Using Atomic Force Microscopy
- Substrate Interference and Strain in the Second-Harmonic Generation from MoSe<sub>2</sub> Monolayers
- Substrate Interference and Strain in the Second-Harmonic Generation from MoSe<sub>2</sub> Monolayers
- Substrate Interference and Strain in the Second-Harmonic Generation from MoSe<sub>2</sub> Monolayers
- Substrate Interference and Strain in the Second-Harmonic Generation from MoSe<sub>2</sub> Monolayers
- Substrate Interference and Strain in the Second-Harmonic Generation from MoSe<sub>2</sub> Monolayers
- Substrate Interference and Strain in the Second-Harmonic Generation from MoSe<sub>2</sub> Monolayers
- Substrate Interference and Strain in the Second-Harmonic Generation from MoSe<sub>2</sub> Monolayers
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