Research Areas
Biography and Research Information
OverviewAI-generated summary
S. Puri's research focuses on the optical properties of two-dimensional materials, specifically transition metal dichalcogenides like MoSe₂. Their work investigates how external factors, such as strain, influence the electronic and optical behavior of these materials. Recent publications examine the effects of biaxial strain, induced by high-temperature physical vapor deposition, on excitons in monolayer MoSe₂. Another study explores substrate interference and its impact on second-harmonic generation in MoSe₂ monolayers. These investigations contribute to understanding the fundamental physics of advanced semiconductor materials and their potential applications.
Metrics
- h-index: 3
- Publications: 3
- Citations: 32
Selected Publications
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Nonlinear anisotropy in phase-tuned wide-gap halides (2026)
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Tuning terahertz optomechanics of <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mi>MoS</mml:mi> <mml:mn>2</mml:mn> </mml:msub> </mml:math> bilayers with homogeneous in-plane strain (2026)
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Biaxial strain tuning of excitons in monolayer <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mi>MoSe</mml:mi> <mml:mn>2</mml:mn> </mml:msub> </mml:math> by high-temperature physical vapor deposition (2024)
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Substrate Interference and Strain in the Second-Harmonic Generation from MoSe<sub>2</sub> Monolayers (2024)
Collaboration Network
Top Collaborators
- Substrate Interference and Strain in the Second-Harmonic Generation from MoSe<sub>2</sub> Monolayers
- Biaxial strain tuning of excitons in monolayer <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mi>MoSe</mml:mi> <mml:mn>2</mml:mn> </mml:msub> </mml:math> by high-temperature physical vapor deposition
- Substrate Interference and Strain in the Second-Harmonic Generation from MoSe<sub>2</sub> Monolayers
- Substrate Interference and Strain in the Second-Harmonic Generation from MoSe<sub>2</sub> Monolayers
- Substrate Interference and Strain in the Second-Harmonic Generation from MoSe<sub>2</sub> Monolayers
- Substrate Interference and Strain in the Second-Harmonic Generation from MoSe<sub>2</sub> Monolayers
- Substrate Interference and Strain in the Second-Harmonic Generation from MoSe<sub>2</sub> Monolayers
- Substrate Interference and Strain in the Second-Harmonic Generation from MoSe<sub>2</sub> Monolayers
- Substrate Interference and Strain in the Second-Harmonic Generation from MoSe<sub>2</sub> Monolayers
- Biaxial strain tuning of excitons in monolayer <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mi>MoSe</mml:mi> <mml:mn>2</mml:mn> </mml:msub> </mml:math> by high-temperature physical vapor deposition
- Biaxial strain tuning of excitons in monolayer <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mi>MoSe</mml:mi> <mml:mn>2</mml:mn> </mml:msub> </mml:math> by high-temperature physical vapor deposition
- Biaxial strain tuning of excitons in monolayer <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mi>MoSe</mml:mi> <mml:mn>2</mml:mn> </mml:msub> </mml:math> by high-temperature physical vapor deposition
- Biaxial strain tuning of excitons in monolayer <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mi>MoSe</mml:mi> <mml:mn>2</mml:mn> </mml:msub> </mml:math> by high-temperature physical vapor deposition
- Biaxial strain tuning of excitons in monolayer <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mi>MoSe</mml:mi> <mml:mn>2</mml:mn> </mml:msub> </mml:math> by high-temperature physical vapor deposition
- Biaxial strain tuning of excitons in monolayer <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mi>MoSe</mml:mi> <mml:mn>2</mml:mn> </mml:msub> </mml:math> by high-temperature physical vapor deposition
- Biaxial strain tuning of excitons in monolayer <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mi>MoSe</mml:mi> <mml:mn>2</mml:mn> </mml:msub> </mml:math> by high-temperature physical vapor deposition
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