Katlin Reynolds
Researcher
Graduate Student Researcher
Research Areas
Biography and Research Information
OverviewAI-generated summary
Katlin Reynolds' research focuses on the characterization of novel materials, particularly two-dimensional (2D) materials like molybdenum selenide (MoSe2) and graphene-based heterostructures. Their work investigates phenomena such as substrate interference and strain effects on the second-harmonic generation in MoSe2 monolayers. Additionally, Reynolds has studied surface roughness measurements of functionalized CVD graphene and hexagonal boron nitride heterostructures using atomic force microscopy. Reynolds has published two papers and has accumulated 15 citations, with an h-index of 1. They have collaborated with researchers at the University of Arkansas at Fayetteville, including Hugh Churchill, Jonathan Mishler, Salvador Barraza‐Lopez, and H. Nakamura.
Metrics
- h-index: 1
- Publications: 2
- Citations: 19
Selected Publications
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Substrate Interference and Strain in the Second-Harmonic Generation from MoSe<sub>2</sub> Monolayers (2024)
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Surface Roughness Measurement of Functionalized CVD Graphene and Hexagonal Boron Nitride Heterostructures Using Atomic Force Microscopy (2024)
Collaboration Network
Top Collaborators
- Substrate Interference and Strain in the Second-Harmonic Generation from MoSe<sub>2</sub> Monolayers
- Surface Roughness Measurement of Functionalized CVD Graphene and Hexagonal Boron Nitride Heterostructures Using Atomic Force Microscopy
- Surface Roughness Measurement of Functionalized CVD Graphene and Hexagonal Boron Nitride Heterostructures Using Atomic Force Microscopy
- Surface Roughness Measurement of Functionalized CVD Graphene and Hexagonal Boron Nitride Heterostructures Using Atomic Force Microscopy
- Surface Roughness Measurement of Functionalized CVD Graphene and Hexagonal Boron Nitride Heterostructures Using Atomic Force Microscopy
- Surface Roughness Measurement of Functionalized CVD Graphene and Hexagonal Boron Nitride Heterostructures Using Atomic Force Microscopy
- Substrate Interference and Strain in the Second-Harmonic Generation from MoSe<sub>2</sub> Monolayers
- Substrate Interference and Strain in the Second-Harmonic Generation from MoSe<sub>2</sub> Monolayers
- Substrate Interference and Strain in the Second-Harmonic Generation from MoSe<sub>2</sub> Monolayers
- Substrate Interference and Strain in the Second-Harmonic Generation from MoSe<sub>2</sub> Monolayers
- Substrate Interference and Strain in the Second-Harmonic Generation from MoSe<sub>2</sub> Monolayers
- Substrate Interference and Strain in the Second-Harmonic Generation from MoSe<sub>2</sub> Monolayers
- Substrate Interference and Strain in the Second-Harmonic Generation from MoSe<sub>2</sub> Monolayers
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