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Biography and Research Information
OverviewAI-generated summary
Alexander Golden's research focuses on the chemical vapor deposition (CVD) processes for germanium-tin (GeSn) alloys. His work investigates the dynamics and mechanisms of GeSn growth, utilizing in situ mass spectrometry and optical monitoring systems to achieve high-quality materials. Golden has published on optimizing GeSn growth for applications such as lasing at 2250 nm. He has collaborated with researchers including Enbo Yang, Joshua M. Grant, and Wei Du at the University of Arkansas at Fayetteville, and Grégory Guisbiers at the University of Arkansas at Little Rock, with whom he shares multiple publications. His scholarly output includes six publications with 25 citations and an h-index of 2. Golden is actively publishing, with his most recent work appearing in 2025.
Metrics
- h-index: 2
- Publications: 7
- Citations: 25
Selected Publications
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Automation and Upgrading of Custom Cold Wall UHV-CVD Reactor for Group IV Material Development (2025)
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<i>In-situ</i> real-time monitoring of GeSn growth using UHV-CVD to achieve high-quality material with lasing at 2250 nm and 100 K [Invited] (2025)
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Gas Phase Reactions Determined by In Situ Mass Spectrometric Investigation for GeSn Chemical Vapor Deposition Processes (2025)
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<i>In situ</i> mass spectrometric investigation to probe GeSn growth dynamics and mechanisms in the chemical vapor deposition processes (2024)
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Tuning the Surface Plasmon Resonance of Gold Dumbbell Nanorods (2021)
Collaboration Network
Top Collaborators
- <i>In-situ</i> real-time monitoring of GeSn growth using UHV-CVD to achieve high-quality material with lasing at 2250 nm and 100 K [Invited]
- <i>In situ</i> mass spectrometric investigation to probe GeSn growth dynamics and mechanisms in the chemical vapor deposition processes
- Mechanisms of Gas Phase Reactions in Germanium-Tin Chemical Vapor Deposition Processes Determined By in Situ Mass Spectrometric Investigation
- A Real-Time Chemical Vapor Deposition Optical Monitoring System for Ge<sub>1-X</sub>Sn<sub>x</sub> Growth Optimization
- Gas Phase Reactions Determined by In Situ Mass Spectrometric Investigation for GeSn Chemical Vapor Deposition Processes
- <i>In-situ</i> real-time monitoring of GeSn growth using UHV-CVD to achieve high-quality material with lasing at 2250 nm and 100 K [Invited]
- <i>In situ</i> mass spectrometric investigation to probe GeSn growth dynamics and mechanisms in the chemical vapor deposition processes
- Mechanisms of Gas Phase Reactions in Germanium-Tin Chemical Vapor Deposition Processes Determined By in Situ Mass Spectrometric Investigation
- A Real-Time Chemical Vapor Deposition Optical Monitoring System for Ge<sub>1-X</sub>Sn<sub>x</sub> Growth Optimization
- Gas Phase Reactions Determined by In Situ Mass Spectrometric Investigation for GeSn Chemical Vapor Deposition Processes
- <i>In-situ</i> real-time monitoring of GeSn growth using UHV-CVD to achieve high-quality material with lasing at 2250 nm and 100 K [Invited]
- <i>In situ</i> mass spectrometric investigation to probe GeSn growth dynamics and mechanisms in the chemical vapor deposition processes
- Mechanisms of Gas Phase Reactions in Germanium-Tin Chemical Vapor Deposition Processes Determined By in Situ Mass Spectrometric Investigation
- A Real-Time Chemical Vapor Deposition Optical Monitoring System for Ge<sub>1-X</sub>Sn<sub>x</sub> Growth Optimization
- Gas Phase Reactions Determined by In Situ Mass Spectrometric Investigation for GeSn Chemical Vapor Deposition Processes
- <i>In situ</i> mass spectrometric investigation to probe GeSn growth dynamics and mechanisms in the chemical vapor deposition processes
- Mechanisms of Gas Phase Reactions in Germanium-Tin Chemical Vapor Deposition Processes Determined By in Situ Mass Spectrometric Investigation
- Gas Phase Reactions Determined by In Situ Mass Spectrometric Investigation for GeSn Chemical Vapor Deposition Processes
- <i>In-situ</i> real-time monitoring of GeSn growth using UHV-CVD to achieve high-quality material with lasing at 2250 nm and 100 K [Invited]
- <i>In situ</i> mass spectrometric investigation to probe GeSn growth dynamics and mechanisms in the chemical vapor deposition processes
- Mechanisms of Gas Phase Reactions in Germanium-Tin Chemical Vapor Deposition Processes Determined By in Situ Mass Spectrometric Investigation
- Gas Phase Reactions Determined by In Situ Mass Spectrometric Investigation for GeSn Chemical Vapor Deposition Processes
- Tuning the Surface Plasmon Resonance of Gold Dumbbell Nanorods
- Tuning the Surface Plasmon Resonance of Gold Dumbbell Nanorods
- Tuning the Surface Plasmon Resonance of Gold Dumbbell Nanorods
- Tuning the Surface Plasmon Resonance of Gold Dumbbell Nanorods
- Tuning the Surface Plasmon Resonance of Gold Dumbbell Nanorods
- Tuning the Surface Plasmon Resonance of Gold Dumbbell Nanorods
- Tuning the Surface Plasmon Resonance of Gold Dumbbell Nanorods
- <i>In situ</i> mass spectrometric investigation to probe GeSn growth dynamics and mechanisms in the chemical vapor deposition processes
- <i>In situ</i> mass spectrometric investigation to probe GeSn growth dynamics and mechanisms in the chemical vapor deposition processes
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