Emmanuel Wanglia
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Researcher
Graduate Student Researcher
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Biography and Research Information
OverviewAI-generated summary
Emmanuel Wanglia is a graduate student at the University of Arkansas at Fayetteville whose research focuses on the growth of semiconductor materials. His work has involved the low-pressure growth of pseudomorphic Germanium-Tin (GeSn) alloys, specifically investigating compositions with a Sn concentration of 16.7%. Wanglia has co-authored two publications on this topic, with the most recent appearing in 2022. His research collaborations include work with Nirosh M. Eldose, Solomon Ojo, Murtadha Alher, and Abbas Sabbar, all affiliated with the University of Arkansas at Fayetteville, with whom he shares two co-authored publications. Wanglia's academic profile includes an h-index of 1 and a total of 19 citations across his two publications.
Metrics
- h-index: 1
- Publications: 2
- Citations: 19
Selected Publications
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Low Pressure Growth of Pseudomorphic Gesn with 16.7% Sn Incorporation (2022)
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Growth of Pseudomorphic GeSn at Low Pressure with Sn Composition of 16.7% (2021)
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Top Collaborators
- Growth of Pseudomorphic GeSn at Low Pressure with Sn Composition of 16.7%
- Low Pressure Growth of Pseudomorphic Gesn with 16.7% Sn Incorporation
- Growth of Pseudomorphic GeSn at Low Pressure with Sn Composition of 16.7%
- Low Pressure Growth of Pseudomorphic Gesn with 16.7% Sn Incorporation
- Growth of Pseudomorphic GeSn at Low Pressure with Sn Composition of 16.7%
- Low Pressure Growth of Pseudomorphic Gesn with 16.7% Sn Incorporation
- Growth of Pseudomorphic GeSn at Low Pressure with Sn Composition of 16.7%
- Low Pressure Growth of Pseudomorphic Gesn with 16.7% Sn Incorporation
- Growth of Pseudomorphic GeSn at Low Pressure with Sn Composition of 16.7%
- Low Pressure Growth of Pseudomorphic Gesn with 16.7% Sn Incorporation
- Growth of Pseudomorphic GeSn at Low Pressure with Sn Composition of 16.7%
- Low Pressure Growth of Pseudomorphic Gesn with 16.7% Sn Incorporation
- Growth of Pseudomorphic GeSn at Low Pressure with Sn Composition of 16.7%
- Low Pressure Growth of Pseudomorphic Gesn with 16.7% Sn Incorporation
- Growth of Pseudomorphic GeSn at Low Pressure with Sn Composition of 16.7%
- Low Pressure Growth of Pseudomorphic Gesn with 16.7% Sn Incorporation
- Growth of Pseudomorphic GeSn at Low Pressure with Sn Composition of 16.7%
- Low Pressure Growth of Pseudomorphic Gesn with 16.7% Sn Incorporation
- Growth of Pseudomorphic GeSn at Low Pressure with Sn Composition of 16.7%
- Growth of Pseudomorphic GeSn at Low Pressure with Sn Composition of 16.7%
- Low Pressure Growth of Pseudomorphic Gesn with 16.7% Sn Incorporation
- Low Pressure Growth of Pseudomorphic Gesn with 16.7% Sn Incorporation
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