Sylvester Amoah Source Confirmed
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Researcher
University of Arkansas at Fayetteville
faculty
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Biography and Research Information
OverviewAI-generated summary
Sylvester Amoah's research focuses on the development and investigation of semiconductor materials, particularly germanium-tin (GeSn) and silicon-germanium-tin (SiGeSn) alloys, for photonic applications. His work involves studying the growth of these materials using techniques such as molecular beam epitaxy (MBE) and exploring their properties for integrated circuits and infrared detection. Recent publications detail the growth of pseudomorphic GeSn with specific tin compositions, the development of monolithic germanium-tin on silicon avalanche photodiodes, and the performance of electrically injected GeSn lasers operating at specific wavelengths.
Amoah also investigates the fundamental aspects of these semiconductor materials, including the role of dislocations on tin diffusion during annealing processes and the characteristics of single quantum wells with enhanced emission. His research network includes several key collaborators at the University of Arkansas at Fayetteville, with whom he has co-authored multiple publications in this field. With a total of 25 publications and 7 citations, Amoah is an active researcher in the field of semiconductor devices.
Metrics
- h-index: 7
- Publications: 25
- Citations: 389
Selected Publications
- Study of electronic band alignment in SiGeSn/GeSn quantum well via internal photoemission effect (2025) DOI
- Development of Monolithic Germanium–Tin on Si Avalanche Photodiodes for Infrared Detection (2024) DOI
- Electrically Injected GeSn Laser Operating up to 135 K (2024) DOI
- Effects of ion implantation with arsenic and boron in germanium-tin layers (2024) DOI
- Role of dislocations on Sn diffusion during low temperature annealing of GeSn layers (2023) DOI
- Study of SiGeSn-based multiple quantum well laser for photonics integrated circuits (2023) DOI
- Depth-dependent photoluminescence characteristic of GeSn/SiGeSn multi-quantum wells (2022) DOI
- Single crystalline Ge thin film growth on <i>c</i>-plane sapphire substrates by molecular beam epitaxy (MBE) (2022) DOI
- Silicon-based electrically injected GeSn lasers (2022) DOI
- Growth of Pseudomorphic GeSn at Low Pressure with Sn Composition of 16.7% (2021) DOI
- Investigation of SiGeSn/GeSn/SiGeSn single quantum well with enhanced well emission (2021) DOI
- Electrically injected GeSn lasers with peak wavelength up to 2.7 μm (2021) DOI
- Electrically Injected GeSn Laser on Si Operating up to 110K (2021) DOI
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