Sylvester Amoah
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Researcher
Also affiliated: Western Illinois University (2017); Lenoir–Rhyne University (2017); North Carolina State University (2017)
Faculty Researcher
Research Areas
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Biography and Research Information
OverviewAI-generated summary
Sylvester Amoah's research focuses on the development and investigation of semiconductor materials, particularly germanium-tin (GeSn) and silicon-germanium-tin (SiGeSn) alloys, for optoelectronic applications. His work involves studying the growth of these materials using techniques such as molecular beam epitaxy (MBE) and exploring their properties for integrated photonics platforms. Recent publications detail the creation of electrically injected GeSn lasers emitting at wavelengths up to 2.7 μm, the development of monolithic GeSn on Si avalanche photodiodes for infrared detection, and the growth of pseudomorphic GeSn layers with significant tin composition. Amoah also investigates the fundamental aspects of these materials, including the role of dislocations on tin diffusion during annealing processes and the characteristics of SiGeSn/GeSn/SiGeSn quantum wells for enhanced emission. He collaborates with several faculty members at the University of Arkansas at Fayetteville, including Wei Du, Shui-Qing Yu, Sudip Acharya, and Solomon Ojo, with whom he has co-authored numerous publications.
Metrics
- h-index: 8
- Publications: 28
- Citations: 438
Selected Publications
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Study of electronic band alignment in SiGeSn/GeSn quantum well via internal photoemission effect (2025)
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Monolithically grown germanium-tin (GeSn) infrared avalanche photodiodes on silicon (Conference Presentation) (2025)
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Development of Monolithic Germanium–Tin on Si Avalanche Photodiodes for Infrared Detection (2024)
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Electrically Injected GeSn Laser Operating up to 135 K (2024)
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Effects of ion implantation with arsenic and boron in germanium-tin layers (2024)
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Role of dislocations on Sn diffusion during low temperature annealing of GeSn layers (2023)
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Study of SiGeSn-based multiple quantum well laser for photonics integrated circuits (2023)
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Depth-dependent photoluminescence characteristic of GeSn/SiGeSn multi-quantum wells (2022)
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Single crystalline Ge thin film growth on <i>c</i> -plane sapphire substrates by molecular beam epitaxy (MBE) (2022)
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Silicon-based electrically injected GeSn lasers (2022)
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Growth of Pseudomorphic GeSn at Low Pressure with Sn Composition of 16.7% (2021)
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Investigation of SiGeSn/GeSn/SiGeSn single quantum well with enhanced well emission (2021)
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Electrically injected GeSn lasers with peak wavelength up to 2.7 μm (2021)
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Electrically Injected GeSn Laser on Si Operating up to 110K (2021)
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Growth and characterization of low-temperature Si<sub>1-x</sub>Sn<sub>x</sub> on Si using plasma enhanced chemical vapor deposition (2020)
Collaboration Network
Top Collaborators
- Electrically injected GeSn lasers with peak wavelength up to 2.7 μm
- Growth of Pseudomorphic GeSn at Low Pressure with Sn Composition of 16.7%
- Single crystalline Ge thin film growth on <i>c</i>-plane sapphire substrates by molecular beam epitaxy (MBE)
- Role of dislocations on Sn diffusion during low temperature annealing of GeSn layers
- Development of Monolithic Germanium–Tin on Si Avalanche Photodiodes for Infrared Detection
Showing 5 of 14 shared publications
- Electrically injected GeSn lasers with peak wavelength up to 2.7 μm
- Growth of Pseudomorphic GeSn at Low Pressure with Sn Composition of 16.7%
- Development of Monolithic Germanium–Tin on Si Avalanche Photodiodes for Infrared Detection
- Investigation of SiGeSn/GeSn/SiGeSn single quantum well with enhanced well emission
- Silicon-based electrically injected GeSn lasers
Showing 5 of 10 shared publications
- Electrically injected GeSn lasers with peak wavelength up to 2.7 μm
- Growth of Pseudomorphic GeSn at Low Pressure with Sn Composition of 16.7%
- Development of Monolithic Germanium–Tin on Si Avalanche Photodiodes for Infrared Detection
- Investigation of SiGeSn/GeSn/SiGeSn single quantum well with enhanced well emission
- Electrically Injected GeSn Laser on Si Operating up to 110K
Showing 5 of 8 shared publications
- Electrically injected GeSn lasers with peak wavelength up to 2.7 μm
- Growth of Pseudomorphic GeSn at Low Pressure with Sn Composition of 16.7%
- Investigation of SiGeSn/GeSn/SiGeSn single quantum well with enhanced well emission
- Silicon-based electrically injected GeSn lasers
- Depth-dependent photoluminescence characteristic of GeSn/SiGeSn multi-quantum wells
Showing 5 of 7 shared publications
- Electrically injected GeSn lasers with peak wavelength up to 2.7 μm
- Single crystalline Ge thin film growth on <i>c</i>-plane sapphire substrates by molecular beam epitaxy (MBE)
- Role of dislocations on Sn diffusion during low temperature annealing of GeSn layers
- Depth-dependent photoluminescence characteristic of GeSn/SiGeSn multi-quantum wells
- Effects of ion implantation with arsenic and boron in germanium-tin layers
Showing 5 of 7 shared publications
- Growth of Pseudomorphic GeSn at Low Pressure with Sn Composition of 16.7%
- Development of Monolithic Germanium–Tin on Si Avalanche Photodiodes for Infrared Detection
- Silicon-based electrically injected GeSn lasers
- Electrically Injected GeSn Laser on Si Operating up to 110K
- Study of SiGeSn-based multiple quantum well laser for photonics integrated circuits
Showing 5 of 6 shared publications
- Role of dislocations on Sn diffusion during low temperature annealing of GeSn layers
- Silicon-based electrically injected GeSn lasers
- Depth-dependent photoluminescence characteristic of GeSn/SiGeSn multi-quantum wells
- Electrically Injected GeSn Laser Operating up to 135 K
- Study of SiGeSn-based multiple quantum well laser for photonics integrated circuits
Showing 5 of 6 shared publications
- Electrically injected GeSn lasers with peak wavelength up to 2.7 μm
- Investigation of SiGeSn/GeSn/SiGeSn single quantum well with enhanced well emission
- Silicon-based electrically injected GeSn lasers
- Electrically Injected GeSn Laser on Si Operating up to 110K
- Electrically Injected GeSn Laser Operating up to 135 K
- Role of dislocations on Sn diffusion during low temperature annealing of GeSn layers
- Depth-dependent photoluminescence characteristic of GeSn/SiGeSn multi-quantum wells
- Effects of ion implantation with arsenic and boron in germanium-tin layers
- Study of SiGeSn-based multiple quantum well laser for photonics integrated circuits
- Study of electronic band alignment in SiGeSn/GeSn quantum well via internal photoemission effect
- Electrically injected GeSn lasers with peak wavelength up to 2.7 μm
- Development of Monolithic Germanium–Tin on Si Avalanche Photodiodes for Infrared Detection
- Effects of ion implantation with arsenic and boron in germanium-tin layers
- Monolithically grown germanium-tin (GeSn) infrared avalanche photodiodes on silicon (Conference Presentation)
- Growth of Pseudomorphic GeSn at Low Pressure with Sn Composition of 16.7%
- Role of dislocations on Sn diffusion during low temperature annealing of GeSn layers
- Investigation of SiGeSn/GeSn/SiGeSn single quantum well with enhanced well emission
- Study of SiGeSn-based multiple quantum well laser for photonics integrated circuits
- Electrically injected GeSn lasers with peak wavelength up to 2.7 μm
- Silicon-based electrically injected GeSn lasers
- Electrically Injected GeSn Laser on Si Operating up to 110K
- Electrically injected GeSn lasers with peak wavelength up to 2.7 μm
- Investigation of SiGeSn/GeSn/SiGeSn single quantum well with enhanced well emission
- Electrically Injected GeSn Laser on Si Operating up to 110K
- Electrically injected GeSn lasers with peak wavelength up to 2.7 μm
- Investigation of SiGeSn/GeSn/SiGeSn single quantum well with enhanced well emission
- Electrically Injected GeSn Laser on Si Operating up to 110K
- Electrically injected GeSn lasers with peak wavelength up to 2.7 μm
- Growth of Pseudomorphic GeSn at Low Pressure with Sn Composition of 16.7%
- Study of SiGeSn-based multiple quantum well laser for photonics integrated circuits
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