Hryhorii Stanchu Data-verified

Affiliation confirmed via AI analysis of OpenAlex, ORCID, and web sources.

Ph.D. student, Research assistant

Last publication 2026 Last refreshed 2026-05-16

grad_student

14 h-index 81 pubs 471 cited

Biography and Research Information

OverviewAI-generated summary

Hryhorii Stanchu's research focuses on the development and characterization of group-IV semiconductor materials and devices for optoelectronic applications. His work investigates the properties of germanium-tin (GeSn) and silicon-germanium-tin (SiGeSn) alloys, particularly their potential for mid-infrared lasers and integrated photonics on silicon platforms. Stanchu has explored methods for strain engineering in these materials, including coherent-interface-induced strain, to improve device performance. His publications detail the growth of GeSn epilayers, the fabrication of electrically injected mid-infrared lasers, and the optical and structural properties of quantum wells for infrared optoelectronics. He has also examined carrier collection efficiency in GeSn quantum wells for all-group-IV photonics. Stanchu collaborates with researchers at the University of Arkansas at Fayetteville, including Fernando Maia de Oliveira, Yuriy I. Mazur, Shui-Qing Yu, and Wei Du, with whom he has co-authored numerous publications.

Metrics

  • h-index: 14
  • Publications: 81
  • Citations: 471

Selected Publications

  • GeSn alloys with ∼21% Sn grown by effusion cell molecular beam epitaxy (2026)
  • Effects of short- and long-range disorder in the photoluminescence of <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:mrow> <mml:msub> <mml:mi>GaAs</mml:mi> <mml:mrow> <mml:mn>1</mml:mn> <mml:mo>−</mml:mo> <mml:mi>x</mml:mi> </mml:mrow> </mml:msub> <mml:msub> <mml:mi>Sb</mml:mi> <mml:mi>x</mml:mi> </mml:msub> <mml:mo>/</mml:mo> <mml:mi>GaAs</mml:mi> </mml:mrow> </mml:math> quantum wells (2025)
  • High-quality GeSn grown in foundry mode via chemical vapor deposition enabling lasing up to 235 K (2025)
    1 citation DOI OpenAlex
  • X-ray diffraction study of Ge islands on Si(001) grown by aspect ratio trapping (2025)
  • Study of electronic band alignment in SiGeSn/GeSn quantum well via internal photoemission effect (2025)
  • Dislocation-Related Photoluminescence Emission in MBE-Grown GeSn (2025)
    4 citations DOI OpenAlex
  • Optical spin polarization by coherent magnetoabsorption generation (2025)
    2 citations DOI OpenAlex
  • <i>In-situ</i> real-time monitoring of GeSn growth using UHV-CVD to achieve high-quality material with lasing at 2250 nm and 100 K [Invited] (2025)
    2 citations DOI OpenAlex
  • MBE growth and characterization of strained GeSn/Ge multiple quantum well structures (2025)
    7 citations DOI OpenAlex
  • Grafted AlGaAs/GeSn optical pumping laser operating up to 130 K (2025)
    6 citations DOI OpenAlex
  • Development of All Group IV SiGeSn Mid Infrared Semiconductor Laser (2024)
  • Ion Implantation Damage Recovery in GeSn Thin Films (2024)
    1 citation DOI OpenAlex
  • Electrically Injected Mid-Infrared GeSn Laser on Si Operating at 140 K (2024)
    17 citations DOI OpenAlex
  • Development of aspect ratio trapping growth of GeSn on Si for midwave infrared applications (2024)
    3 citations DOI OpenAlex
  • Epitaxial growth and characterization of GaAs (111) on 4H-SiC (2024)
    1 citation DOI OpenAlex

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Collaboration Network

147 Collaborators 20 Institutions 7 Countries

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