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Presence Current · Arkansas
Last published 2026
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Refreshed 2026-10-06

Joshua M. Grant

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Also affiliated: Wilkes University (2022)

13 h-index 38 pubs 954 cited

Biography and Research Information

OverviewAI-generated summary

Joshua M. Grant's research focuses on the development and characterization of semiconductor materials, particularly germanium-tin (GeSn) alloys, for optoelectronic applications. His work investigates the fabrication of GeSn-based photodetectors and lasers integrated onto silicon platforms, aiming for mid-infrared and shortwave infrared imaging. Grant has explored techniques such as ultra-high vacuum chemical-vapor deposition (UHV-CVD) for growing high-quality GeSn films with varying tin compositions. His publications detail the performance of these materials in prototype devices, including photodiodes and electrically injected lasers operating at specific wavelengths and temperatures. Grant collaborates with several faculty members at the University of Arkansas at Fayetteville, including Wei Du, Solomon Ojo, Hryhorii Stanchu, and Shui-Qing Yu, with whom he has co-authored multiple publications. His research contributions are reflected in a h-index of 13, with over 40 publications and nearly 1000 citations.

Metrics

  • h-index: 13
  • Publications: 38
  • Citations: 954

Selected Publications

  • Study of GeSn Selective Area Growth with Demonstration of SWIR Light Detection (2026)
    arXiv (Cornell University) OpenAlex
  • In-situ real-time monitoring of GeSn growth using UHV-CVD to achieve high-quality material with lasing at 2250 nm and 100 K [Invited] (2025)
    Optical Materials Express 3 citations DOI OpenAlex
  • Gas Phase Reactions Determined by In Situ Mass Spectrometric Investigation for GeSn Chemical Vapor Deposition Processes (2025)
    ECS Journal of Solid State Science and Technology DOI OpenAlex
  • Development of aspect ratio trapping growth of GeSn on Si for midwave infrared applications (2024)
    Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena 4 citations DOI OpenAlex
  • In situ mass spectrometric investigation to probe GeSn growth dynamics and mechanisms in the chemical vapor deposition processes (2024)
    Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena 2 citations DOI OpenAlex
  • Comprehensive material study of Ge grown by aspect ratio trapping on Si substrate (2024)
    Journal of Physics D Applied Physics 4 citations DOI OpenAlex
  • Study of all-group-IV SiGeSn mid-IR lasers with dual wavelength emission (2023)
    Scientific Reports 13 citations DOI OpenAlex
  • Study of SiGeSn-based multiple quantum well laser for photonics integrated circuits (2023)
  • Investigation of the cap layer for improved GeSn multiple quantum well laser performance (2023)
    Optics Letters 2 citations DOI OpenAlex
  • Low Pressure Growth of Pseudomorphic Gesn with 16.7% Sn Incorporation (2022)
    ECS Meeting Abstracts DOI OpenAlex
  • Study of critical optical confinement factor for GeSn-based multiple quantum well lasers (2022)
    Applied Physics Letters 11 citations DOI OpenAlex
  • Enhanced carrier collection efficiency of GeSn single quantum well towards all-group-IV photonics applications (2022)
    Journal of Physics D Applied Physics 11 citations DOI OpenAlex
  • Growth of Pseudomorphic GeSn at Low Pressure with Sn Composition of 16.7% (2021)
    Materials 19 citations DOI OpenAlex
  • Electrically injected GeSn lasers with peak wavelength up to 2.7 μm (2021)
    Photonics Research 81 citations DOI OpenAlex
  • Growth and characterization of low-temperature Si1-xSnx on Si using plasma enhanced chemical vapor deposition (2020)
    Optical Materials Express 17 citations DOI OpenAlex

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Collaboration Network

75 Collaborators 11 Institutions 2 Countries

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